Star Wars Roleplay: Chaos

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Approved Tech Executor Armor

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U N I O N

OUT OF CHARACTER INFORMATION
latest

PRODUCTION INFORMATION
TECHNICAL SPECIFICATIONS
  • Classification: Multipurpose
  • Weight: Average
  • Resistances:
    • Energy: Very High
    • Kinetic: Average
    • Lightsabers: High
    • Other:
    • EMP/ION : Average
SPECIAL FEATURES
STRENGTHS
  • Very Highly resistant to blasters.
  • Highly resistant to kinetic forces.
  • Mobility -Relatively lightweight, compared to other armor variants, wearers can easily move around.
WEAKNESSES
  • Vulnerable to lightsabers.
  • EMP/ION vulnerable.
  • Accessibility - Not easy to put on or take out due to the many plates.
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Last edited:
Ben Craig Ben Craig

Thank you for your patience. Having looked through this submission there are two areas which jump out at me.​

1) Materials

You have used Ersteel 145 in their submission as one of the formative materials. The resistances of Ersteel 145 are as below:​

  • Energy (And other Blaster type weapons): Very High
  • Kinetic: Average
  • Lightsabers: High
  • Elemental: High
  • EMP/ION: Average
  • Acid: None

The resistances of your armour as also as below.​

  • Energy: Very High
  • Kinetic: High
  • Lightsabers: Low
  • Other:
  • EMP/ION : Low

As you can see there are several differences between the resistances of the two. A submission must reflect the materials used to create it. As such, you will need to include the high lightsaber and average EMP resistance.​

2) Stealth

Your submission contains the two following systems, Stealth Field Generator and an Optical Camouflage System, the Chaos factory rules state the following.​

Particularly rare or powerful special features may necessitate using a lower level of production (cloaking technology, personal cloaking devices, gemcutters, crystal grav traps, moon dust, equivalent stealth or anti stealth technologies), or rare canon technologies (Hyperwave Inertial Momentum Sustainers, etc) and their equivalents will only be permitted at Semi-Unique production.

In this case, the system contains both a cloaking device and stealth technology, as such the submission needs to be reduced to semi-unique or the stealth systems need to be removed from the submission.​
 
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