Molecular Manipulation Implant B

[Laertia Io]

• Intent: To create a generic blaster rifle.
• Image Source: N/A (No Image)
• Canon Link: N/A
• Permissions: N/A
• Primary Source: E-11 Blaster Rifle

PRODUCTION INFORMATION

• Manufacturer: BlasTech Industries
• Affiliation: BlasTech Industries
• Market Status: Open-Market
• Model: EZ-33 Amon-Setter Battle Rifle
• Modularity: No
• Production: Mass-Produced
• Material: Durasteel, blaster components

TECHNICAL SPECIFICATIONS

• Classification: Combat Implant allowing for ranged attack
• Size: Very Small
• Weight: Very Light
• Ammunition Type: Psychic Energy
• Ammunition Capacity: High | Organic Battery that starts at one hundred percent charge, gradually decreasing to zero over ten seconds
• Effective Range: Personal
• Rate of Fire: High
• Damage Output: High
• Recoil: Very Low

SPECIAL FEATURES

• Implant causes Cryonic Radiation tuned to be harmless to the user to emit from the palms in a focused beam that rapidly freezes targets
• Implant charged by the mental energy of the brain, slowly recharging from minute amounts of it
• Capable of self repair
• Renders user resistant to Cryonics and cold weather

STRENGTHS

WEAKNESSES



DESCRIPTION